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Model-guided contrastive fine-tuning for industrial anomaly detection

  • Aitor ARTOLA*
  • , Yannis KOLODZIEJ
  • , Jean-Michel MOREL
  • , Thibaud EHRET
  • *Corresponding author for this work

Research output: Book Chapters | Papers in Conference ProceedingsConference paper (refereed)Researchpeer-review

Abstract

State-of-the-art industrial visual anomaly detection now relies on modeling the distribution of pre-trained neural network features. To this goal, most of the work has focused on how to model features of normal data and the choice of the pre-trained network. The current trend is to use a network pre-trained using self-supervised contrastive learning so that the same network can be used for all possible downstream applications. However, this also means that the network is object and task agnostic, meaning that features are very generic and not optimized with the detection model. In this paper, we propose to look at how to specialize features for a given application so as to improve performance and propose a fine-tuning process taking advantage of the differentiability of some popular models. This fine-tuning is performed following a contrastive learning framework meaning that no real anomalies are necessary during the process. We demonstrate the improvement on both localization and quality of detection on the MVtec dataset.
Original languageEnglish
Title of host publicationProceedings: 2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops, CVPRW 2024
PublisherIEEE
Pages3981-3991
Number of pages11
ISBN (Electronic)9798350365474
ISBN (Print)9798350365481
DOIs
Publication statusPublished - 2024
Externally publishedYes
Event2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops - Seattle, United States
Duration: 17 Jun 202418 Jun 2024

Publication series

NameIEEE Computer Society Conference on Computer Vision and Pattern Recognition Workshops
ISSN (Print)2160-7508
ISSN (Electronic)2160-7516

Workshop

Workshop2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops
Country/TerritoryUnited States
CitySeattle
Period17/06/2418/06/24

Bibliographical note

Publisher Copyright:
© 2024 IEEE.

Keywords

  • anomaly detection
  • contrastive learning
  • self-supervised learning

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