Soft magnetic granular material Co-Fe-Hf-O for micromagnetic device applications

Liangliang LI; Ankur M. CRAWFORD; Shan X. WANG; Ann F. MARSHALL; Ming MAO; Thomas SCHNEIDER; Randhir BUBBER

doi:10.1063/1.1853238

Soft magnetic granular material Co-Fe-Hf-O for micromagnetic device applications

Liangliang LI, Ankur M. CRAWFORD, Shan X. WANG, Ann F. MARSHALL, Ming MAO, Thomas SCHNEIDER, Randhir BUBBER

Research output: Journal Publications › Journal Article (refereed) › peer-review

23 Citations (Scopus)

Abstract

A granular magnetic material, Co-Fe-Hf-O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3 nm/s. The electrical and magnetic properties of Co-Fe-Hf-O film can be tuned by changing O₂ during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O₂ (Ar+ O₂) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.

Original language	English
Article number	10F907
Journal	Journal of Applied Physics
Volume	97
Issue number	10
DOIs	https://doi.org/10.1063/1.1853238
Publication status	Published - 15 May 2005
Externally published	Yes

Funding

The work at Stanford University was supported in part by Intel Corp. and National Science Foundation.

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10.1063/1.1853238

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@article{dc10e9cedc70443784878fad15efc558,

title = "Soft magnetic granular material Co-Fe-Hf-O for micromagnetic device applications",

abstract = "A granular magnetic material, Co-Fe-Hf-O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3 nm/s. The electrical and magnetic properties of Co-Fe-Hf-O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2 (Ar+ O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.",

author = "Liangliang LI and CRAWFORD, {Ankur M.} and WANG, {Shan X.} and MARSHALL, {Ann F.} and Ming MAO and Thomas SCHNEIDER and Randhir BUBBER",

year = "2005",

month = may,

day = "15",

doi = "10.1063/1.1853238",

language = "English",

volume = "97",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "10",

}

TY - JOUR

T1 - Soft magnetic granular material Co-Fe-Hf-O for micromagnetic device applications

AU - LI, Liangliang

AU - CRAWFORD, Ankur M.

AU - WANG, Shan X.

AU - MARSHALL, Ann F.

AU - MAO, Ming

AU - SCHNEIDER, Thomas

AU - BUBBER, Randhir

PY - 2005/5/15

Y1 - 2005/5/15

N2 - A granular magnetic material, Co-Fe-Hf-O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3 nm/s. The electrical and magnetic properties of Co-Fe-Hf-O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2 (Ar+ O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.

AB - A granular magnetic material, Co-Fe-Hf-O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3 nm/s. The electrical and magnetic properties of Co-Fe-Hf-O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2 (Ar+ O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.

UR - http://www.scopus.com/inward/record.url?scp=20944438279&partnerID=8YFLogxK

U2 - 10.1063/1.1853238

DO - 10.1063/1.1853238

M3 - Journal Article (refereed)

AN - SCOPUS:20944438279

SN - 0021-8979

VL - 97

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

M1 - 10F907

ER -

Soft magnetic granular material Co-Fe-Hf-O for micromagnetic device applications

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