Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay

Richard GOOD*, S. Joe QIN

*Corresponding author for this work

Research output: Book Chapters | Papers in Conference ProceedingsConference paper (refereed)Referred Conference Paperpeer-review

31 Citations (Scopus)

Abstract

The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.
Original languageEnglish
Title of host publicationProceedings of the 2002 American Control Conference
PublisherInstitute of Electrical and Electronics Engineers
Pages2156-2161
Number of pages6
ISBN (Electronic)0780372999
ISBN (Print)0780372980
DOIs
Publication statusPublished - May 2002
Externally publishedYes
Event2002 American Control Conference (ACC) - Anchorage, United States
Duration: 8 May 200210 May 2002

Publication series

NameProceedings of the American Control Conference
PublisherInstitute of Electrical and Electronics Engineers
ISSN (Print)0743-1619
ISSN (Electronic)2378-5861

Conference

Conference2002 American Control Conference (ACC)
Country/TerritoryUnited States
CityAnchorage
Period8/05/0210/05/02

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