Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay

Richard GOOD; S. Joe QIN

doi:10.1109/acc.2002.1023956

Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay

Richard GOOD^*
, S. Joe QIN

^*Corresponding author for this work

Research output: Book Chapters | Papers in Conference Proceedings › Conference paper (refereed) › Referred Conference Paper › peer-review

32 Citations (Scopus)

Abstract

The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.

Original language	English
Title of host publication	Proceedings of the 2002 American Control Conference
Publisher	Institute of Electrical and Electronics Engineers
Pages	2156-2161
Number of pages	6
ISBN (Electronic)	0780372999
ISBN (Print)	0780372980
DOIs	https://doi.org/10.1109/acc.2002.1023956
Publication status	Published - May 2002
Externally published	Yes
Event	2002 American Control Conference (ACC) - Anchorage, United States Duration: 8 May 2002 → 10 May 2002

Publication series

Name	Proceedings of the American Control Conference
Publisher	Institute of Electrical and Electronics Engineers
ISSN (Print)	0743-1619
ISSN (Electronic)	2378-5861

Conference

Conference	2002 American Control Conference (ACC)
Country/Territory	United States
City	Anchorage
Period	8/05/02 → 10/05/02

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Access to Document

10.1109/acc.2002.1023956

Cite this

@inproceedings{af454257c7c0499c8c7c927145d03659,

title = "Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay",

abstract = "The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.",

author = "Richard GOOD and QIN, \{S. Joe\}",

year = "2002",

month = may,

doi = "10.1109/acc.2002.1023956",

language = "English",

isbn = "0780372980",

series = "Proceedings of the American Control Conference",

publisher = "Institute of Electrical and Electronics Engineers",

pages = "2156--2161",

booktitle = "Proceedings of the 2002 American Control Conference",

address = "United States",

note = "2002 American Control Conference (ACC) ; Conference date: 08-05-2002 Through 10-05-2002",

}

GOOD, R & QIN, SJ 2002, Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay. in Proceedings of the 2002 American Control Conference. Proceedings of the American Control Conference, Institute of Electrical and Electronics Engineers, pp. 2156-2161, 2002 American Control Conference (ACC), Anchorage, Alaska, United States, 8/05/02. https://doi.org/10.1109/acc.2002.1023956

Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay. / GOOD, Richard; QIN, S. Joe.
Proceedings of the 2002 American Control Conference. Institute of Electrical and Electronics Engineers, 2002. p. 2156-2161 (Proceedings of the American Control Conference).

Research output: Book Chapters | Papers in Conference Proceedings › Conference paper (refereed) › Referred Conference Paper › peer-review

TY - GEN

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AU - QIN, S. Joe

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N2 - The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.

AB - The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.

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U2 - 10.1109/acc.2002.1023956

DO - 10.1109/acc.2002.1023956

M3 - Conference paper (refereed)

SN - 0780372980

T3 - Proceedings of the American Control Conference

SP - 2156

EP - 2161

BT - Proceedings of the 2002 American Control Conference

PB - Institute of Electrical and Electronics Engineers

T2 - 2002 American Control Conference (ACC)

Y2 - 8 May 2002 through 10 May 2002

ER -

Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay

Abstract

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Conference

UN SDGs

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