@inproceedings{af454257c7c0499c8c7c927145d03659,
title = "Stability Analysis of Double Ewma Run-To-Run Control with Metrology Delay",
abstract = "The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.",
author = "Richard GOOD and QIN, \{S. Joe\}",
year = "2002",
month = may,
doi = "10.1109/acc.2002.1023956",
language = "English",
isbn = "0780372980",
series = "Proceedings of the American Control Conference",
publisher = "Institute of Electrical and Electronics Engineers",
pages = "2156--2161",
booktitle = "Proceedings of the 2002 American Control Conference",
address = "United States",
note = "2002 American Control Conference (ACC) ; Conference date: 08-05-2002 Through 10-05-2002",
}